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NEC
Develops High-Power Gallium Nitride Transistor Amplifier for 3G Base
Stations |
| 21st
August , 2006 |
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ASIA Japan : NEC Corporation today announced the successful development of a compact gallium nitride power transistor amplifier, which boasts the world's highest output power level of 400W while featuring low-distortion characteristics, for third generation (3G) base stations. This amplifier is composed of a single transistor package, which achieves the world's greatest power output amplification under a W-CDMA scheme, without using any power-combining circuits. This research has been carried out under the "High-Power, High-Frequency Gallium Nitride Device Project" of the Research and Development Association for Future Electron Devices (FED) that is supported by the New Energy and Industrial Technology Development Organization (NEDO). The features of the newly developed GaN amplifier are as follows: The GaN power
transistor achieves high output power density under high-current (1A/mm)
and high voltage (45V) operation owing to NEC's proprietary field-modulating
plate technology. The features of the newly developed power amplifier for 3G base stations include: Single-ended GaN amplifier
with a digital predistorter for W-CDMA base stations The transistors used for this amplifier are made on a GaN epitaxial wafer, which was developed under the NEDO "High-Power, High-Frequency Gallium Nitride Device Project," and manufactured by Toyoda Gosei Co, Ltd..
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